Silicon Wafer Classification

Kev ntxuav lub cev
Muaj peb txoj kev ntxuav lub cev. ① Txhuam lossis txhuam: tuaj yeem tshem tawm cov kab mob sib kis thiab feem ntau cov yeeb yaj kiab txuas nrog lub wafer. ② High-pressure tu: kua yog txau rau ntawm wafer nto, thiab lub nozzle siab yog siab li ob peb puas cua. Kev tu siab siab cia siab rau qhov kev txiav txim, thiab lub wafer tsis yooj yim rau khawb lossis puas. Txawm li cas los xij, cov tshuaj txau siab yuav tsim hluav taws xob zoo li qub, uas tuaj yeem zam tau los ntawm kev kho qhov kev ncua deb thiab lub kaum sab xis ntawm lub nozzle thiab lub wafer los yog ntxiv cov tshuaj tiv thaiv kab mob. ③ Ultrasonic tu: ultrasonic suab zog yog kis mus rau hauv cov tshuaj, thiab cov kab mob ntawm lub wafer yog ntxuav tawm los ntawm cavitation. Txawm li cas los xij, nws yog qhov nyuaj dua kom tshem tawm cov khoom me dua 1 micron los ntawm cov qauv wafer. Ua kom cov zaus mus rau ultra-high zaus band yuav ua tiav cov txiaj ntsig zoo dua.
Tshuaj ntxuav
Kev ntxuav tshuaj yog tshem tawm tsis pom kev paug tawm ntawm atoms thiab ions. Muaj ntau txoj hauv kev, suav nrog cov kuab tshuaj rho tawm, pickling (sulfuric acid, nitric acid, aqua regia, ntau cov kua qaub sib xyaw, thiab lwm yam) thiab plasma method. Ntawm lawv, hydrogen peroxide system tu txoj kev muaj txiaj ntsig zoo thiab tsis muaj kuab paug ib puag ncig. Txoj kev dav dav yog thawj zaug ntxuav cov silicon wafer nrog cov kua qaub nrog qhov sib piv ntawm H2SO4: H2O2=5: 1 lossis 4: 1. Cov khoom muaj zog oxidizing ntawm cov tshuaj ntxuav decomposes thiab tshem tawm cov organic teeb meem; Tom qab rinsing nrog dej ultrapure, nws yog ces ntxuav nrog ib tug alkaline ntxuav tov nrog ib tug muaj pes tsawg leeg piv ntawm H2O: H2O2: NH4OH=5: 2: 1 los yog 5: 1: 1 los yog 7: 2: 1. Vim yog oxidation ntawm H2O2 thiab complexation ntawm NH4OH, ntau hlau ions tsim ruaj khov soluble complexes thiab yaj nyob rau hauv dej; Tom qab ntawd siv cov kua qaub ntxuav nrog qhov sib piv ntawm H2O: H2O2: HCL=7: 2: 1 lossis 5: 2: 1. Vim yog oxidation ntawm H2O2 thiab dissolution ntawm hydrochloric acid, nrog rau cov complexation ntawm chloride ions, ntau hlau tsim complex ions soluble nyob rau hauv dej, yog li ua tiav lub hom phiaj ntawm tu.
Radioactive tracer atomic tsom xam thiab loj spectrometry tsom xam qhia tau hais tias qhov zoo tshaj plaws nyhuv ntawm ntxuav silicon wafers yog siv ib tug hydrogen peroxide system, thiab tag nrho cov tshuaj reagents siv, H2O2, NH4OH, thiab HCl, yuav ua tau kiag li volatilized. Thaum ntxuav silicon wafers nrog H2SO4 thiab H2O2, kwv yees li 2 × 1010 atoms ib square centimeter ntawm sulfur atoms yuav raug tso rau saum npoo ntawm silicon wafer, uas tuaj yeem tshem tawm tag nrho los ntawm kev siv cov kua qaub tom kawg. Siv H2O2 system los ntxuav silicon wafers tawm tsis muaj residue, tsis muaj teeb meem, thiab tseem muaj txiaj ntsig zoo rau cov neeg ua haujlwm noj qab haus huv thiab kev tiv thaiv ib puag ncig. Tom qab tau kho nrog txhua cov tshuaj ntxuav hauv kev ntxuav ntawm silicon wafers, lawv yuav tsum tau muab yaug nrog dej ultrapure.